| HS编码 | 商品名称 | 退税率 | 计量单位 | 海关监管 | 申报要素·检疫 | 编码对比 |
| 84862021.00 | 制造半导体器件或集成电路用化学气相沉积装置
[Chemical Vapour Deposition(CVD)equipment for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | -- | |
| 84862022.00 | 制造半导体器件或集成电路用物理气相沉积装置
[Physical Vapour Deposition(PVD)equipment for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | 对比-84862021.00 | |
| 84862029.00 | 其他制造半导体器件或集成电路用薄膜沉积设备
[Other film deposition equipment for the manufacture of semiconductor devices or of electronic integrated circuis] |
13% | 台/千克 | 查看详情 | 对比-84862022.00 |
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