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| HS编码 | 品名 | 实例汇总 | 申报要素·退税 | 编码对比 |
|---|---|---|---|---|
| 32099020.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
(同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1) [Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
0条 | 查看详情 | -- |
| 32082010.30 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
(同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1) [Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
0条 | 查看详情 | 对比-32099020.20 |
| 32091000.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
(同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1) [Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
0条 | 查看详情 | 对比-32082010.30 |
| 32082020.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
(同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1) [Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
0条 | 查看详情 | 对比-32091000.20 |
| 32099010.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
(同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1) [Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
0条 | 查看详情 | 对比-32082020.20 |
| 32089090.21 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
(同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1) [Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
0条 | 查看详情 | 对比-32099010.20 |
| 32081000.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
(同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1) [Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
0条 | 查看详情 | 对比-32089090.21 |
| 32099090.21 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
(同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1) [Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
0条 | 查看详情 | 对比-32081000.20 |
| 39219090.90 | 未列名塑料板,片,膜,箔,扁条
(未列名塑料板,片,膜,箔,扁条离子交换膜、两用物项管制结构复合材料的层压板除外) [Other plates, sheets, film, foil and strip of plastic，not elsewhere specified or included [other than ion (ic)exchange membrane and laminated board made of composite materials under sensitive item control]] |
675条 | 查看详情 | 对比-32099090.21 |
| 39191099.00 | 其他宽度≤20cm的自粘塑料板片等
(其他宽度≤20cm的自粘塑料板片等包括膜,箔,带,扁条及其他扁平形状材料,成卷的) [Other self-adhesive plates, sheets, film, foil, tape, strip and other flat shapes, in rolls of a width not exceeding 20cm] |
647条 | 查看详情 | 对比-39219090.90 |
| 39201090.90 | 其他非泡沫乙烯聚合物板,片,膜,箔及扁条
(其他非泡沫乙烯聚合物板,片,膜,箔及扁条未用其他材料强化,层压,支撑或用类似方法合制,非农用) [Plates, sheets, film, foil and strip, of polymers of ethylene, non-cellular, not reinforced, laminated, supported or similarly combined with other materials, not for agricultural use] |
614条 | 查看详情 | 对比-39191099.00 |
| 39209990.90 | 其他非泡沫塑料板,片,膜,箔,扁条
(其他非泡沫塑料板,片,膜,箔,扁条未用其他材料强化、层压、支撑) [Other plates, sheets, film, foil and strip, of plastics(not reinforced, laminated, supported)] |
522条 | 查看详情 | 对比-39201090.90 |
| 39202090.90 | 非泡沫丙烯聚合物板,片,膜,箔及扁条
(非泡沫丙烯聚合物板,片,膜,箔及扁条未用其他材料强化,层压,支撑或用类似方法合制,非农用) [Plates, sheets, film, foil and strip, of polymers of propylene, non-cellular and not reinforced, laminated, supported or similarly combined with other materials not for agricultural use] |
327条 | 查看详情 | 对比-39209990.90 |
| 39209910.00 | 聚四氟乙烯制非泡沫塑料板,片,箔
(聚四氟乙烯制非泡沫塑料板,片,箔含膜及扁条,未用其他材料层压,支撑或类似方法合制) [Plates, sheets, film, foil and strip, of polytetrafluoroethylene, non-cellular, not reinforced, supported or similarly combined with other materials] |
245条 | 查看详情 | 对比-39202090.90 |
| 39204900.90 | 其他氯乙烯聚合物板,片,膜,箔及扁条
(其他氯乙烯聚合物板,片,膜,箔及扁条非泡沫料的,未用其他材料强化,层压,支撑,非农用) [Other plates, sheets, film, foil and strip, of PVC, non-cellular and not reinorced, laminated, supported or similarly combined with other materials, not for agricultural use] |
237条 | 查看详情 | 对比-39209910.00 |