| HS编码 | 商品名称 | 退税率 | 计量单位 | 海关监管 | 申报要素·检疫 | 编码对比 |
| 30024930.30 (增) | CAR-T细胞治疗药品生产用病毒载体
[Viral vectors for CAR-T cell therapy production] |
13% | 千克/株 | AB | 查看详情 | -- |
| 30043200.10 (增) | 《兴奋剂目录》所列含其他皮质甾类激素的药品（包括其衍生物及结构类似物,不含抗菌素,包括零售包装）
[Drugs listed in the 'Prohibited Substances List' containing other corticosteroids (including derivatives and structural analogs, excluding antibiotics, including retail packaging)] |
13% | 千克/无 | L | 查看详情 | 对比-30024930.30 |
| 30044900.94 (增) | 具有抗癌作用的含有生物碱及其衍生物的药品（混合或非混合，治病或防病用已配定剂量或零售包装）
[Drugs containing alkaloids and their derivatives with anti-cancer effects (mixed or non mixed, prescribed dosage or retail packaging for treating or preventing diseases)] |
13% | 千克/无 | Q | 查看详情 | 对比-30043200.10 |
| 32081000.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
[Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
- | 千克/无 | A | 查看详情 | 对比-30044900.94 |
| 32082010.30 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
[Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
- | 千克/无 | A | 查看详情 | 对比-32081000.20 |
| 32082020.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
[Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
- | 千克/无 | A | 查看详情 | 对比-32082010.30 |
| 32089090.21 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
[Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
- | 千克/无 | A | 查看详情 | 对比-32082020.20 |
| 32089090.22 (增) | 同时满足以下指标的用于集成电路生产的聚酰亚胺原液和聚酰亚胺树脂溶液：挥发性有机物含量＞700g/L，粘度（25℃）为2500-3000mPa·s
[Polyimide precursor solution and polyimide resin solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, viscosity (25°C) 2500-3000mPa·s] |
- | 千克/无 | A | 查看详情 | 对比-32089090.21 |
| 32091000.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
[Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
- | 千克/无 | A | 查看详情 | 对比-32089090.22 |
| 32099010.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
[Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
- | 千克/无 | A | 查看详情 | 对比-32091000.20 |
| 32099020.20 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
[Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
- | 千克/无 | A | 查看详情 | 对比-32099010.20 |
| 32099090.21 (增) | 同时满足以下指标的用于集成电路生产的防反射薄膜生成液：挥发性有机物含量＞700g/L，反射值（N）为1-2.1，及吸光指数（K）（248nm或193nm波长测试）为0-1
[Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1] |
- | 千克/无 | A | 查看详情 | 对比-32099020.20 |
| 32099090.22 (增) | 同时满足以下指标的用于集成电路生产的旋涂玻璃：挥发性有机物含量＞700g/L，密度为0.8-0.9g/cm3
[Spin-coating glass used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, density 0.8-0.9g/cm3] |
- | 千克/无 | A | 查看详情 | 对比-32099090.21 |
| 34029000.00 (增) | 非零售包装有机表面活性剂制品
[Non-retail packaged organic surfactant products] |
13% | 千克/无 | 查看详情 | 对比-32099090.22 | |
| 35079090.20 (增) | 抗癌药原料（门冬酰胺酶）
[Anti cancer drug raw material (asparaginase)] |
13% | 千克/无 | AB | 查看详情 | 对比-34029000.00 |
| 36010000.40 (增) | 模压的胶质推进剂；含硝化粘接剂及铝粉＞5%的推进剂
[Molded gel propellant; propellant containing nitrated binder and aluminum powder > 5%] |
0% | 千克/无 | 3 | 查看详情 | 对比-35079090.20 |
| 36010000.92 (增) | 单基双基发射药；黑火药；限于购买、销售、运输管理的民用推进剂
[Single-base and double-base propellants; black powder; civilian propellants restricted to purchase, sale, and transport management] |
0% | 千克/无 | k | 查看详情 | 对比-36010000.40 |
| 36020010.20 (增) | 黑梯炸药
[Black ladder explosives] |
0% | 千克/无 | k | 查看详情 | 对比-36010000.92 |
| 37019920.00 (增) | 照相制版用
[Photographic printing plate use] |
13% | 千克/平方米 | 查看详情 | 对比-36020010.20 | |
| 38011000.40 (增) | 纯度高于百万分之五硼量，密度大于1.50g/cm3的核级石墨；20℃下的密度、拉伸断裂应变、热膨胀系数符合特殊要求的人造细晶粒整体石墨；高纯度（>99.9%）、高强度（抗折强度>30M pa）、高密度（>1.73 克/立方厘米）的人造石墨
["Nuclear-grade graphite with boron content higher than 5 parts per million and density greater than 1.50 g/cm³; artificial fine-grain integral graphite with density, tensile fracture strain, and thermal expansion coefficient meeting special requirements at 20°C; high purity (>99.9%), high strength (flexural strength >30M pa), and high density (>1.73 g/cm³) artificial graphite] |
0% | 千克/无 | 3 | 查看详情 | 对比-37019920.00 |